Archivio Istituzionale della RicercaIn this paper we present the fabrication and characterization of low loss buried channel waveguides in porous silicon (PS), designed to work around 1.55 μm, and obtained for the first time by direct laser writing. This novel technique, derived from the laser ablation, is a good alternative to the traditional photolithographic process. In fact, owing to the low thermal conductivity of PS, the high temperatures required for the writing are achievable with low power lasers, making the process highly efficient and possible with the standard equipment present in most laboratories
Low loss laser-written channel waveguides in porous silicon / A. M., Rossi; Perrone, Guido; Cappelluti, Federica; Camarchia, Vittorio; L., Boarino; G., Amato. - STAMPA. - 2:(2000), pp. 762-763. (Intervento presentato al convegno Lasers and Electro-Optics Society 2000 Annual Meeting. LEOS 2000. 13th Annual Meeting tenutosi a Rio Grande, Portorico nel 13-16 November, 2000) [10.1109/LEOS.2000.894077].
Low loss laser-written channel waveguides in porous silicon
PERRONE, Guido;CAPPELLUTI, Federica;CAMARCHIA, VITTORIO;
2000
Abstract
In this paper we present the fabrication and characterization of low loss buried channel waveguides in porous silicon (PS), designed to work around 1.55 μm, and obtained for the first time by direct laser writing. This novel technique, derived from the laser ablation, is a good alternative to the traditional photolithographic process. In fact, owing to the low thermal conductivity of PS, the high temperatures required for the writing are achievable with low power lasers, making the process highly efficient and possible with the standard equipment present in most laboratories
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https://hdl.handle.net/11583/1506519
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