Archivio Istituzionale della RicercaAn electrochemical and photoelectrochemical study of pure and iron implanted copper in alkaline solution has been performed by means of: - photopotential measurements at different electrodic voltages; - voltammetric curves tracing, in order to reveale the effects induced by light on the current; - polarization resistance (Rp) measurements, in order to determine the corrosion rate of the electrodes. The reduction mechanism on pure copper are discussed. Iron, entering the surface oxide lattice in iron implanted copper, stabilizes the passive film in alkaline solution.
Electrochemical and photoelectrochemical study of pure and iron implanted copper in alkaline medium / Angelini, EMMA PAOLA MARIA VIRGINIA; M., Bassoli; P. L., Bonora; M., Maja; P., Mazzoldi. - In: MATERIALS CHEMISTRY. - ISSN 0390-6035. - STAMPA. - 6:4-5(1981), pp. 343-358. [10.1016/0390-6035(81)90059-6]
Electrochemical and photoelectrochemical study of pure and iron implanted copper in alkaline medium
ANGELINI, EMMA PAOLA MARIA VIRGINIA;
1981
Abstract
An electrochemical and photoelectrochemical study of pure and iron implanted copper in alkaline solution has been performed by means of: - photopotential measurements at different electrodic voltages; - voltammetric curves tracing, in order to reveale the effects induced by light on the current; - polarization resistance (Rp) measurements, in order to determine the corrosion rate of the electrodes. The reduction mechanism on pure copper are discussed. Iron, entering the surface oxide lattice in iron implanted copper, stabilizes the passive film in alkaline solution.
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https://hdl.handle.net/11583/1653836
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