Archivio Istituzionale della RicercaIn this paper we are reporting a fabrication process for multi-section telecom lasers based on surface defined lateral gratings, which is compatible with low-cost high-throughput nano-imprint lithography. A new grating definition process is developed, which allow a better control of the cross section geometry to obtain higher coupling strengths.
Trench width dependant deeply etched surface-defined InP gratings for low-cost high speed DFB/DBR / S., Afzal; F., Schnabel; W., Scholz; J. P., Reithmaier; Vallone, MARCO ERNESTO; Bardella, Paolo; Montrosset, Ivo. - (2011). (Intervento presentato al convegno 37th International Conference on Micro and Nano Engineering (MNE 2011) tenutosi a Berlin nel 19 - 23 September 2011).
Trench width dependant deeply etched surface-defined InP gratings for low-cost high speed DFB/DBR
VALLONE, MARCO ERNESTO;BARDELLA, PAOLO;MONTROSSET, Ivo
2011
Abstract
In this paper we are reporting a fabrication process for multi-section telecom lasers based on surface defined lateral gratings, which is compatible with low-cost high-throughput nano-imprint lithography. A new grating definition process is developed, which allow a better control of the cross section geometry to obtain higher coupling strengths.
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https://hdl.handle.net/11583/2501454
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