In this work, photocurable perfluoropolyethers (PFPEs) have been used for the fabrication of microfluidic devices by a direct photolithographic process. During this maskassisted photopolymerization technique, the material is directly photopolymerized in the presence of a mask, avoiding the use of a master. We demonstrate the high level of control in transferring micropattern features with high density, a minimum transferred size of 15 μm, a high aspect ratio (at least up to 6.5), and complex shapes useful for microfluidic applications. Moreover, we successfully apply this technology to fabricate sealed devices; the fabrication time scale for the overall process is around 5 min. The devices are able to withstand a flow pressure of up to 3.8 bar, as required for most microfluidics. Finally, the devices are tested with a model reaction employing organic solvents.

Direct Photolithography of Perfluoropolyethers for Solvent-Resistant Microfluidics / Vitale, Alessandra; Quaglio, Marzia; Marasso, SIMONE LUIGI; Chiodoni, Angelica; Cocuzza, Matteo; Bongiovanni, Roberta Maria. - In: LANGMUIR. - ISSN 0743-7463. - STAMPA. - 29:50(2013), pp. 15711-15718. [10.1021/la402755q]

Direct Photolithography of Perfluoropolyethers for Solvent-Resistant Microfluidics

VITALE, ALESSANDRA;QUAGLIO, Marzia;MARASSO, SIMONE LUIGI;CHIODONI, ANGELICA;COCUZZA, MATTEO;BONGIOVANNI, Roberta Maria
2013

Abstract

In this work, photocurable perfluoropolyethers (PFPEs) have been used for the fabrication of microfluidic devices by a direct photolithographic process. During this maskassisted photopolymerization technique, the material is directly photopolymerized in the presence of a mask, avoiding the use of a master. We demonstrate the high level of control in transferring micropattern features with high density, a minimum transferred size of 15 μm, a high aspect ratio (at least up to 6.5), and complex shapes useful for microfluidic applications. Moreover, we successfully apply this technology to fabricate sealed devices; the fabrication time scale for the overall process is around 5 min. The devices are able to withstand a flow pressure of up to 3.8 bar, as required for most microfluidics. Finally, the devices are tested with a model reaction employing organic solvents.
2013
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11583/2528285
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