Perfluoropolyether (PFPE) structures can be functionalized with acrylic groups using appropriate hydrogenated acrylic monomers: the macromers obtained are highly reactive under UV irradiation, and fluorinated polymers can be obtained. In the first part of this work is described the synthesis of new PFPE (meth)acrylic oligomers by extending OH-terminated fluorinated chains with urethane groups and reactive acrylic functions. The photopolymerization reaction of each product is then reported followed by the characterisation of the main thermal, mechanical and surface properties of UV-cured coatings. The polymers have good thermal resistance and fair mechanical and chemical resistance. More interestingly they show very low refractive index and low surface tension. For these latter properties the products can be advantageously used in highly demanding applications such as photonic devices and nano-patterning. © 2011 Society of Chemical Industry.

Perfluoropolyether polymers by UV curing: Design, synthesis and characterization / Bongiovanni, ROBERTA MARIA; Medici, Andrea; Zompatori, A.; Garavaglia, S.; Tonelli, C.. - In: POLYMER INTERNATIONAL. - ISSN 0959-8103. - 61:1(2012), pp. 65-73. [10.1002/pi.3149]

Perfluoropolyether polymers by UV curing: Design, synthesis and characterization

BONGIOVANNI, ROBERTA MARIA;MEDICI, ANDREA;
2012

Abstract

Perfluoropolyether (PFPE) structures can be functionalized with acrylic groups using appropriate hydrogenated acrylic monomers: the macromers obtained are highly reactive under UV irradiation, and fluorinated polymers can be obtained. In the first part of this work is described the synthesis of new PFPE (meth)acrylic oligomers by extending OH-terminated fluorinated chains with urethane groups and reactive acrylic functions. The photopolymerization reaction of each product is then reported followed by the characterisation of the main thermal, mechanical and surface properties of UV-cured coatings. The polymers have good thermal resistance and fair mechanical and chemical resistance. More interestingly they show very low refractive index and low surface tension. For these latter properties the products can be advantageously used in highly demanding applications such as photonic devices and nano-patterning. © 2011 Society of Chemical Industry.
2012
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11583/2495787
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